Method of stripping layers of organic materials

United States of America Patent

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Aug 6, 1991
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N/A
app pub date
Sep 6, 1990
filing date
Sep 6, 1990

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Expired

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Abstract

Gaseous sulfur trioxide is used to remove various organic coatings, polymerized photoresist, and especially implant and deep-UV hardened photoresist layers, during the manufacture of semiconductor or ceramic devices.

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BEST LABEL CO INC	13260 MOORE STREET CERRITOS CA 90703

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Gupta, Subhash	1578 Meadow Ridge Cir., San Jose, CA 95131	107	3127
Singh, Bhanwar	17122 Heatherwood Way, Morgan Hill, CA 95037	264	3967
Waleh, Ahmad	2344 Emerson St., Palo Alto, CA 94301	5	119

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Method of stripping layers of organic materials

Number of patents in Portfolio can not be more than 2000

United States of America Patent

07579064

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PATENT NO	5037506
SERIAL NO	07579064
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07579064

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