Method of forming a patterned aluminum layer and article
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United States of America Patent
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-
Aug 27, 1991
Issued Date -
N/A
app pub date -
Apr 3, 1989
filing date -
Jul 20, 1987
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A process is described for the microdemetalization of an aluminized mylar film, the steps including the printing of a micropattern of a caustic resistant, U.V. curable resin on the aluminum surface, etching of the exposed aluminum with a warm saturated caustic solution, followed immediately by rinsing the patterned surface with an acidic solution to neutralize the caustic and stop the etching. Micropatterns having line widths as small as 0.2 mils may be formed by the process.
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