Process for determining the focussing of a photolithographic apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Aug 27, 1991
Grant Date -
N/A
app pub date -
Dec 29, 1989
filing date -
Dec 30, 1988
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
In a process for determining the focussing of a photolithographic apparatus on a resist-coated wafer, comprising the following steps: 1) insolating, successively in various places, the resist by a test pattern, a different focussing being carried out for each insolation; 2) developing the resist; 3) observing the wafer for determing the optimal insolation and adopting the corresponding setting for the apparatus, it is provided, between steps 2) and 3), the step consisting in heating the wafer up to a temperature higher than the vitreous transition temperature of the resist.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully