Pattern inspection apparatus

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United States of America Patent

PATENT NO 5046109
SERIAL NO

07473103

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An apparatus for inspecting a pattern formed on an object such as a mask or a reticle in accordance with design data includes a character extraction circuit that employs a multiplicity of templates for detecting any of a plurality of different types of bends of an edge of the pattern with respect to a reference edge, for any of a plurality of rotation angles of the reference edge. Although a large number of templates is employed, template outputs are sorted into a small number of groups, and a comparison is made between synthesized template outputs for data representing an image of a pattern region on the object and for corresponding reference data. The apparatus also includes a direct comparison circuit for comparing image data and reference data to detect defects in the pattern and to determine the size of any defect along different directions (ignoring size along an edge of the pattern). The direct comparison circuit also determines the maximum size of the defect along the different directions. A dead band is provided about the edge of the pattern to reduce the detection of a false defect by the direct comparison circuit. However, the character extraction circuit is capable of detecting any defect throughout the pattern.

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Patent Owner(s)

Patent OwnerAddress
NIKON CORPORATIONTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujimori, Yoshihiko Tokyo, JP 13 194
Hirose, Keiichi Tokyo, JP 31 309

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