Method for coating substrates with silicon based compounds
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 10, 1991
Grant Date -
N/A
app pub date -
Nov 8, 1989
filing date -
Nov 8, 1989
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method of depositing thin films of silicon based compounds, particularly silicon dioxide, by cathode reactive sputtering utilizes a rotating cylindrical magnetron driven by a d.c. potential. The result is a technique of forming a uniform film on large substrates with high deposition rates. Arcing normally associated with sputtering troublesome dielectric coatings such as silicon oxides is substantially eliminated.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully