US Patent No: 5,047,131

Number of patents in Portfolio can not be more than 2000

Method for coating substrates with silicon based compounds

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Abstract

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A method of depositing thin films of silicon based compounds, particularly silicon dioxide, by cathode reactive sputtering utilizes a rotating cylindrical magnetron driven by a d.c. potential. The result is a technique of forming a uniform film on large substrates with high deposition rates. Arcing normally associated with sputtering troublesome dielectric coatings such as silicon oxides is substantially eliminated.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
COATING INDUSTRIES INVESTMENT CORP.FAIRFIELD, CA7

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Boehmler, Carolynn Vacaville, CA 2 127
Hofmann, James J Northfield, MN 54 615
Wolfe, Jesse D San Ramon, CA 12 557

Cited Art Landscape

Patent Info (Count) # Cites Year
 
The BOC Group, Inc. (1)
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Tokyo Shibaura Denki Kabushiki Kaisha (1)
* 4,548,691 Thermally insulating glazing 53 1984
 
VON ARDENNE ANLAGENTECHNIK GMBH (4)
* 4,417,968 Magnetron cathode sputtering apparatus 29 1983
* 4,443,318 Cathodic sputtering apparatus 36 1983
* 4,445,997 Rotatable sputtering apparatus 36 1983
* 4,466,877 Magnetron cathode sputtering apparatus 49 1983
 
BOC GROUP PLC, THE (2)
* 4,356,073 Magnetron cathode sputtering apparatus 116 1981
* 4,422,916 Magnetron cathode sputtering apparatus 71 1982
 
COOK MEDICAL TECHNOLOGIES LLC (1)
* 2005/0205,097 Medical devices and methods of selectively and alternately isolating bronchi or lungs 19 2005
 
LEYBOLD AKTIENGESELLSCHAFT (2)
* 4,426,264 Method and means for controlling sputtering apparatus 18 1981
* 4,534,841 Solar controlled glazing and method of producing glazing 37 1984
 
CANON KABUSHIKI KAISHA (1)
* 2003/0137,680 IMAGE PROCESSING APPARATUS, METHOD OF CONTROLLING SAME, AND IMAGE PROCESSING SYSTEM 4 1998
* Cited By Examiner

Patent Citation Ranking

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Patent Info (Count) # Cites Year
 
Other [Check patent profile for assignment information] (4)
6,391,400 Thermal control films suitable for use in glazing 58 1998
6,392,239 Optical array converting UV radiation 1 1999
6,352,626 Sputter ion source for boron and other targets 11 2000
6,822,789 Optical array converting UV radiation 1 2002
 
BALZERS UND LEYBOLD DEUTSCHLAND HOLDING AG (2)
* 5,427,665 Process and apparatus for reactive coating of a substrate 21 1991
* 5,364,518 Magnetron cathode for a rotating target 29 1992
 
Isoflux, Inc. (1)
* 6,497,803 Unbalanced plasma generating apparatus having cylindrical symmetry 8 2001
 
Saint-Gobain Vitrage International (1)
* 5,158,660 Rotary sputtering cathode 9 1991
 
NANYA TECHNOLOGY CORPORATION (3)
* 6,753,584 Antireflective coating layer 7 2000
6,627,389 Photolithography method using an antireflective coating 1 2000
6,614,085 Antireflective coating layer 29 2001
 
Micron Technology, Inc. (2)
* 8,936,702 System and method for sputtering a tensile silicon nitride film 0 2006
* 2007/0212,893 System and method for sputtering a tensile silicon nitride film 1 2006
 
SAINT-GOBAIN VITRAGE (4)
* 5,891,556 Transparent substrate with antireflection coating 69 1996
6,238,781 Transparent substrate with antireflection coating 28 1998
6,337,124 Transparent substrate with antireflection coating 24 2000
6,495,203 Transparent substrate with antireflection coating 8 2001
 
CARDINAL CG COMPANY (28)
6,964,731 Soil-resistant coating for glass surfaces 30 1999
6,974,629 Low-emissivity, soil-resistant coating for glass surfaces 16 1999
6,660,365 Soil-resistant coating for glass surfaces 19 2000
6,652,974 Hard, scratch-resistant coatings for substrates 8 2002
6,939,446 Soil-resistant coating for glass surfaces 1 2003
7,157,123 Plasma-enhanced film deposition 4 2003
* 2004/0163,945 Plasma-enhanced film deposition 2 2003
* 2004/0200,418 Plasma spray systems and methods of uniformly coating rotary cylindrical targets 1 2004
7,294,403 Soil-resistant coating for glass surfaces 0 2004
* 2005/0025,982 Soil-resistant coating for glass surfaces 4 2004
7,491,301 Methods and apparatuses for depositing film on both sides of a pane 0 2004
7,294,404 Graded photocatalytic coatings 14 2004
8,092,660 Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films 0 2005
* 2006/0000,706 Soil-resistant coating for glass surfaces 0 2005
7,713,632 Low-maintenance coatings 7 2005
7,604,865 Low-maintenance coatings 8 2005
* 2006/0115,655 Low-emissivity, soil-resistant coating for glass surfaces 0 2005
7,923,114 Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films 1 2005
* 2007/0102,291 PLASMA-ENHANCED FILM DEPOSITION 5 2006
7,862,910 Photocatalytic coatings having improved low-maintenance properties 4 2007
7,989,094 Opposed functional coatings having comparable single surface reflectances 0 2007
* 2007/0248,756 OPPOSED FUNCTIONAL COATINGS HAVING COMPARABLE SINGLE SURFACE REFLECTANCES 8 2007
7,820,296 Low-maintenance coating technology 12 2008
7,820,309 Low-maintenance coatings, and methods for producing low-maintenance coatings 2 2008
8,696,879 Low-maintenance coating technology 0 2010
8,506,768 Low-maintenance coatings, and methods for producing low-maintenance coatings 1 2010
RE44155 Low-maintenance coatings 0 2011
RE43817 Low-maintenance coatings 0 2011
 
SAINT-GOBAIN GLASS FRANCE (4)
* 6,602,587 Glass substrates coated with a stack of thin layers having reflective properties in the infra-red and/or solar ranges 17 1999
6,804,048 Glass substrates coated with a stack of thin layers having reflective properties in the infra-red and/or solar ranges 13 2003
7,037,577 Glass substrates coated with a stack of thin layers having reflective properties in the infra-red and/or solar ranges 6 2004
* 2004/0241,457 Glass substrates coated with a stack of thin layers having reflective properties in the infra-red and/or solar ranges 2 2004
 
APPLIED FILMS CORPORATION (5)
* 5,563,734 Durable low-emissivity solar control thin film coating 141 1994
* 5,487,821 Anode structure for magnetron sputtering systems 5 1995
* 5,683,558 Anode structure for magnetron sputtering systems 14 1996
* 6,074,730 Broad-band antireflection coating having four sputtered layers 28 1997
* 2004/0129,561 Cylindrical magnetron magnetic array mid span support 4 2003
 
COATING INDUSTRIES INVESTMENT CORP. (10)
* 5,384,021 Sputtering apparatus 11 1993
* 5,377,045 Durable low-emissivity solar control thin film coating 113 1993
* 5,616,225 Use of multiple anodes in a magnetron for improving the uniformity of its plasma 31 1994
* 5,521,765 Electrically-conductive, contrast-selectable, contrast-improving filter 53 1994
* 5,814,195 Sputtering system using cylindrical rotating magnetron electrically powered using alternating current 145 1996
6,589,657 Anti-reflection coatings and associated methods 10 2001
7,014,741 Cylindrical magnetron with self cleaning target 5 2003
* 2004/0163,943 Cylindrical magnetron with self cleaning target 1 2003
* 2005/0006,233 Cylindrical AC/DC magnetron with compliant drive system and improved electrical and thermal isolation 0 2004
* 2006/0278,519 Adaptable fixation for cylindrical magnetrons 2 2005
 
SEAGATE TECHNOLOGY LLC (2)
* 8,652,310 Trim magnets to adjust erosion rate of cylindrical sputter targets 0 2008
* 2010/0018,854 TRIM MAGNETS TO ADJUST EROSION RATE OF CYLINDRICAL SPUTTER TARGETS 1 2008
 
VON ARDENNE ANLAGENTECHNIK GMBH (2)
6,736,948 Cylindrical AC/DC magnetron with compliant drive system and improved electrical and thermal isolation 12 2002
* 2005/0051,422 Cylindrical magnetron with self cleaning target 7 2004
 
SCHOTT SOLAR PV, INC. (1)
* 5,527,389 Apparatus for forming diffusion junctions in solar cell substrates 29 1995
 
BEKAERT ADVANCED COATINGS (1)
* 6,375,814 Magnetron with parallel race track and modified end portions thereof 10 2001
 
LG DISPLAY CO., LTD. (1)
* 8,377,265 Method of forming inorganic insulating layer and method of fabricating array substrate for display device using the same 1 2007
 
GENERAL PLASMA, INC. (1)
9,388,490 Rotary magnetron magnet bar and apparatus containing the same for high target utilization 0 2010
 
BECTON, DICKINSON AND COMPANY (1)
* 5,510,155 Method to reduce gas transmission 24 1994
 
CANON KABUSHIKI KAISHA (1)
* 5,946,013 Ink jet head having a protective layer with a controlled argon content 2 1996
 
The Regents of the University of California (1)
* 5,425,860 Pulsed energy synthesis and doping of silicon carbide 26 1993
 
3M INNOVATIVE PROPERTIES COMPANY (2)
6,749,813 Fluid handling devices with diamond-like films 29 2000
7,106,939 Optical and optoelectronic articles 6 2002
 
The BOC Group, Inc. (1)
* 5,171,411 Rotating cylindrical magnetron structure with self supporting zinc alloy target 31 1991
 
KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.) (1)
* 2012/0174,864 PLASMA CVD APPARATUS 2 2010
 
SAMSUNG DISPLAY CO., LTD. (16)
* 8,808,457 Apparatus for depositing a multilayer coating on discrete sheets 0 2003
RE40787 Multilayer plastic substrates 7 2004
RE40531 Ultrabarrier substrates 31 2004
8,900,366 Apparatus for depositing a multilayer coating on discrete sheets 0 2005
7,198,832 Method for edge sealing barrier films 64 2005
7,510,913 Method of making an encapsulated plasma sensitive device 9 2006
7,767,498 Encapsulated devices and method of making 1 2006
7,727,601 Method for edge sealing barrier films 7 2007
7,648,925 Multilayer barrier stacks and methods of making multilayer barrier stacks 13 2007
9,337,446 Encapsulated RGB OLEDs having enhanced optical output 0 2008
9,184,410 Encapsulated white OLEDs having enhanced optical output 0 2008
8,590,338 Evaporator with internal restriction 0 2009
* 2010/0193,468 METHOD FOR EDGE SEALING BARRIER FILMS 5 2010
8,955,217 Method for edge sealing barrier films 0 2012
8,904,819 Evaporator with internal restriction 0 2013
9,362,530 Encapsulated white OLEDs having enhanced optical output 0 2015
 
Guardian Industries Corp. (1)
* 5,403,458 Sputter-coating target and method of use 39 1993
 
Sputtering Components, Inc. (4)
8,182,662 Rotary cathode for magnetron sputtering apparatus 5 2009
8,900,428 Sputtering apparatus 1 2012
9,418,823 Sputtering apparatus 0 2013
9,312,108 Sputtering apparatus 0 2014
 
Kobe Steel, Ltd. (1)
* 9,133,547 Plasma CVD apparatus 0 2010
 
Societe Anonyme de Traitment des Metaux et Alliages Company (SATMA) (1)
* 5,830,579 Strip based on coated aluminum, which is resistant to corrosion and is deformable 1 1996
 
Emiel Vanderstraeten (1)
* 5,853,816 Method of coating a sputter cathode with a layer of material to be applied to a substrate by sputtering 7 1997
 
Gencoa Ltd. (2)
* 9,028,660 Low impedance plasma 0 2008
* 2011/0127,157 LOW IMPEDANCE PLASMA 0 2008
 
Surface Engineered Products Corporation (1)
6,436,252 Method and apparatus for magnetron sputtering 14 2000
 
APPLIED MATERIALS, INC. (18)
* 5,470,452 Shielding for arc suppression in rotating magnetron sputtering systems 21 1993
* 5,725,746 Shielding for arc suppression in rotating magnetron sputtering systems 18 1995
7,399,385 Alternating current rotatable sputter cathode 5 2004
* 2005/0224,343 Power coupling for high-power sputtering 4 2004
7,695,590 Chemical vapor deposition plasma reactor having plural ion shower grids 13 2004
8,058,156 Plasma immersion ion implantation reactor having multiple ion shower grids 14 2004
7,767,561 Plasma immersion ion implantation reactor having an ion shower grid 21 2004
* 2006/0049,043 Magnetron assembly 4 2004
* 2006/0065,524 Non-bonded rotatable targets for sputtering 5 2004
* 2006/0096,855 Cathode arrangement for atomizing a rotatable target pipe 0 2004
* 2006/0278,524 System and method for modulating power signals to control sputtering 6 2005
* 2006/0278,521 System and method for controlling ion density and energy using modulated power signals 8 2005
7,842,355 System and method for modulation of power and power related functions of PECVD discharge sources to achieve new film properties 1 2005
* 2007/0095,281 System and method for power function ramping of microwave liner discharge sources 2 2005
* 2007/0098,893 Coated substrate created by systems and methods for modulation of power and power related functions of PECVD discharge sources to achieve new film properties 3 2006
* 2008/0138,502 METHOD FOR THE PRODUCTION OF AN SIN:H LAYER ON A SUBSTRATE 1 2007
7,905,995 Alternating current rotatable sputter cathode 5 2008
* 2008/0264,786 ALTERNATING CURRENT ROTATABLE SPUTTER CATHODE 0 2008
* Cited By Examiner