Method for coating substrates with silicon based compounds

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5047131
SERIAL NO

07433690

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method of depositing thin films of silicon based compounds, particularly silicon dioxide, by cathode reactive sputtering utilizes a rotating cylindrical magnetron driven by a d.c. potential. The result is a technique of forming a uniform film on large substrates with high deposition rates. Arcing normally associated with sputtering troublesome dielectric coatings such as silicon oxides is substantially eliminated.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
COATING INDUSTRIES INVESTMENT CORP.FAIRFIELD, CA7

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Boehmler, Carolynn Vacaville, CA 2 128
Hofmann, James J Northfield, MN 54 623
Wolfe, Jesse D San Ramon, CA 12 573

Cited Art Landscape

Patent Info (Count) # Cites Year
 
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* Cited By Examiner

Patent Citation Ranking

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Patent Info (Count) # Cites Year
 
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* Cited By Examiner