
US Patent No: 5,047,131
Number of patents in Portfolio can not be more than 2000
Method for coating substrates with silicon based compounds
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Sep 10, 1991
Issued date -
Nov 8, 1989
filing date -
07/433,690
serial no -
Expired
status
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Abstract
A method of depositing thin films of silicon based compounds, particularly silicon dioxide, by cathode reactive sputtering utilizes a rotating cylindrical magnetron driven by a d.c. potential. The result is a technique of forming a uniform film on large substrates with high deposition rates. Arcing normally associated with sputtering troublesome dielectric coatings such as silicon oxides is substantially eliminated.
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First Claim
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International Classification(s)
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Cited Art
| Patent Info | (Count) | # Cites | Year |
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| 4,417,968 Magnetron cathode sputtering apparatus | 29 | 1983 | |
| 4,443,318 Cathodic sputtering apparatus | 32 | 1983 | |
| 4,445,997 Rotatable sputtering apparatus | 32 | 1983 | |
| 4,466,877 Magnetron cathode sputtering apparatus | 45 | 1983 | |
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| 4,356,073 Magnetron cathode sputtering apparatus | 105 | 1981 | |
| 4,422,916 Magnetron cathode sputtering apparatus | 65 | 1982 | |
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| 4,426,264 Method and means for controlling sputtering apparatus | 15 | 1981 | |
| 4,534,841 Solar controlled glazing and method of producing glazing | 35 | 1984 | |
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| 2003/0137,680 IMAGE PROCESSING APPARATUS, METHOD OF CONTROLLING SAME, AND IMAGE PROCESSING SYSTEM | 1998 | ||
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| 2005/0205,097 Medical devices and methods of selectively and alternately isolating bronchi or lungs | 2005 | ||
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| 4,769,291 Transparent coatings by reactive sputtering | 59 | 1987 | |
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| 4,548,691 Thermally insulating glazing | 53 | 1984 | |