Dual ion beam ballistic alloying process
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United States of America Patent
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Oct 8, 1991
Issued Date -
N/A
app pub date -
Dec 17, 1990
filing date -
Oct 11, 1988
priority date (Note) -
Expired
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Abstract
The invention relates to a low temperature, dual beam vacuum deposition process for forming a hard, stress reduced, ballistically alloyed film such as diamond onto a substrate.
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