System to reduce wave shift error in spectrophotometer caused by hot spots in the light source
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 8, 1991
Grant Date -
N/A
app pub date -
Dec 6, 1989
filing date -
Dec 6, 1989
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An improved near infrared spectrophotometer is disclosed which reduces wave shift errors arising from hot spots in a light source. A ground quartz plate uniformly diffuses radiation from the light source to evenly illuminate the entrance slit for a diffraction grating. Radiation emerges from the entrance slit with a uniform angular intensity distribution and is dispersed into a spectrum by a reflecting diffraction grating towards an exit slit. A narrow wavelength band of radiation passes through the exit slit to illuminate a sample. Because the entrance slit is uniformly illuminated, without regard to variations in radiation intensity due to hot spots in the source, wave shift errors in the reflectivity measurements for the sample are reduced.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully