Multi-zone planar heater assembly and method of operation
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United States of America Patent
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-
Oct 22, 1991
Grant Date -
N/A
app pub date -
Sep 19, 1989
filing date -
Sep 19, 1989
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A heater assembly and method of operation for use in processing of a substrate such as a semiconductor wafer, for example in a chemical vapor deposition (CVD) reactor chamber, the heater assembly including a dielectric heater base, radially spaced apart and circumferentially extending heater element segments being arranged on the heater base, operation of the plurality of heater elements being independently regulated, a heater shroud being arranged in spaced apart relation over the heater elements while supporting the substrate for maintaining a blanket of inert gas between the heater elements and the heater shroud. Inert gas is preferably introduced through a central opening in the heater base and is selectively regulated for facilitating processing of the substrate.
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