Amorphous fluoropolymer pellicle films
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United States of America Patent
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Oct 29, 1991
Grant Date -
N/A
app pub date -
Sep 6, 1989
filing date -
Sep 6, 1989
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A pellicle comprising a thin, durable film of substantially uniform thickness which absorbs less than 10% light at wavelengths between 190 and 820 nanometers, tautly adhered to one edge of an enclosed support frame, said thin film comprising amorphous fluoropolymers having a refractive index between 1.24 and 1.41. Pellicles of this type are dust defocusing covers for photomasks and reticles used to project patterns onto light sensitive substrates such as photoresist-coated semiconductor wafers which are used in the manufacture of integrated circuits.
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