Importance

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Abstract

An electric field producing structure especially suitable as electron or field forming sources in vacuum devices is disclosed herein along with its method of manufacture. The structure so disclosed includes upper and lower, generally planar electrodes spaced apart in parallel confronting relationship to one another with a dielectric layer therebetween so as to electrically insulate the electrodes from one another. A series of apertures are formed with the upper electrode and the dielectric layer. Each aperture is deeper than it is wide and contains a single electrically conductive protuberance extending up from the lower electrode. Each protuberance is formed in at least two stages by successive physical evaporative deposition processes so that the uppermost tip of each protuberance in its associated aperture is substantially coplanar with the upper electrode.

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First Claim