Process for the preparation of novolak resins with low metal ion content
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United States of America Patent
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Dec 17, 1991
Grant Date -
N/A
app pub date -
Jul 10, 1990
filing date -
Jul 15, 1989
priority date (Note) -
Expired
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Abstract
The invention relates to a process for the preparation of novolak resins having a low amount of metal ions. In the process, a conventional resin in an organic solution is brought into contact with an acidic, preferably complex-forming compound which preferably is present in an aqueous phase. The resin solutions may be used in the production of photoresists.
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