Process for etching a metal oxide coating and simultaneous deposition of a polymer film, application of this process to the production of a thin film transistor
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 7, 1992
Issued Date -
N/A
app pub date -
Dec 8, 1989
filing date -
Dec 19, 1988
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The process of the invention consists of subjecting a metal oxide coating (106, 108), located on a glass substrate (100), to the action of a gaseous plasma (109) containing 10 to 88% by volume of hydrogen, 2 to 30% by volume of a hydrocarbon and 10 to 50% of an inert vector gas, bringing about the formation of a polymer coating (110) on the parts of the substrate not provided with oxide, by dissocation of the gaseous mixture, and the partial chemical etching of the oxide (106, 108) by the formation of organometallic compounds.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully