Liquid crystal programmable photoresist exposure method for making a set of masks
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United States of America Patent
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-
Jan 21, 1992
Issued Date -
N/A
app pub date -
Dec 17, 1990
filing date -
Oct 2, 1989
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Photoresist layers are rapidly exposed in a pattern determined by electronically stored data by exposure of the photoresist through a high resolution liquid crystal shutter array.
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