Rotational flexure stage
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United States of America Patent
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-
Jan 28, 1992
Grant Date -
N/A
app pub date -
Jul 5, 1990
filing date -
Jul 5, 1990
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The flexure stage disclosed herein is useful in aligning a semiconductor wafer during microlithographic exposure to define circuit elements on the surface of the wafer. The stage is a unitary structure which permits essentially lossless small angle relative rotation of a central portion of the stage with respect to an outer, annular portion of the stage. Three pairs of slots define three links extending radially with respect to the axis of rotation and, radially outwardly from each pair of slots, a respective transverse slot in the outer portion provides radial compliance for the outer end of the respective link.
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