Apparatus for forming, correcting pattern
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United States of America Patent
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-
Feb 4, 1992
Issued Date -
N/A
app pub date -
Sep 14, 1988
filing date -
Apr 23, 1985
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A means is employed to blow a gas for forming a conductive film and a gas for forming an insulating film onto the surface of a specimen while it is being irradiated with an ion beam, in order to easily and quickly form a small conductive pattern and an insulating pattern in a laminated manner, and a means is employed to cut a pattern by the irradiation with an ion beam and to form a new electrically conductive pattern by blowing a gas while the pattern is being irradiated with the ion beam in order to accomplish an electric connection between the patterns, making it possible to locally cut or connect tiny patterns.
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