Photoresist stripper
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United States of America Patent
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-
Feb 25, 1992
Grant Date -
N/A
app pub date -
May 1, 1990
filing date -
May 1, 1990
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Photo resist stripper compositions comprising N-alkyl-2-pyrrolidone, 1,2-propanediol and tetraalkylammonium hydroxide. The photoresist strippers are useful at high stripping temperatures (105.degree. C.-125.degree. C.) to remove hard baked photoresist without damaging semiconductor substrates or metallurgy.
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