Rotating cylindrical magnetron structure for large area coating
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United States of America Patent
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Mar 17, 1992
Issued Date -
N/A
app pub date -
Nov 6, 1990
filing date -
Nov 8, 1989
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Mechanisms for supporting, rotating, cooling and energizing a cylindrical target structure in a magnetron through supports at each end of the target structure. Two specific configurations are described. Particular arrangements of magnets are provided within the target cylinder. Two adjacent rotating target cylinders may optionally be employed in order to increase the rate of depositing sputtered material on a substrate. The various features of this invention are particularly adapted for a large-scale cylindrical magnetron used for sputtering coatings on architectural glass panels, automobile windshields and the like, but are also advantageous for use in coating very small substrates.
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