DC reactively sputtered antireflection coatings
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United States of America Patent
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Apr 14, 1992
Grant Date -
N/A
app pub date -
Oct 11, 1990
filing date -
Oct 11, 1990
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A multilayer antireflection coating designed for deposition in in-line coating machines by DC reactive sputtering. About half of the total thickness of the coating may be formed from zinc oxide which has a high sputtering rate.
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