Importance

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Abstract

Apparatus for non-planar treatment of a workpiece utilizing exposure beam lithography includes a vacuum chamber, an exposure beam generator such as an electron beam generator disposed in the chamber for directing a beam towards a work location, a chuck disposed in the chamber for holding and positioning the workpiece at the work location, a rotary motorized stage disposed in the chamber and responsive to first control signals for selectively rotating the chuck, and thus the workpiece, to thereby expose different areas of the workpiece to the beam, and a linear motorized stage disposed in the chamber on which the rotary stage is mounted, said linear motor being responsive to second control signals for selectively moving the rotary stage and thus the chuck and workpiece in a linear direction which is generally parallel with the axis of rotation of the rotary stage. The workpiece is thus exposed over additional areas by operation of the linear stage. A controller supplies first and second control signals to the rotary stage and linear stage respectively to selectively effect the operation thereof.

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First Claim