Methods and apparatus for material deposition
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United States of America Patent
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Jun 9, 1992
Issued Date -
N/A
app pub date -
Jan 26, 1990
filing date -
Dec 27, 1988
priority date (Note) -
Expired
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Abstract
The present invention discloses methods and apparatus for depositing thin films of complex (compound) materials, including ferroelectrics, superconductors, and materials with high dielectric constants through a technique which is hereby entitled photo-enhanced chemical vapor deposition and activation (PECVDA). The technique involves the use of multiple heating sources including a resistive heat bias heater, a tuned optical source (UV or laser) and a source (halogen lamps or microwave sources) for applying high energy, rapid thermal pulses in a precise time sequence.
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