Exposure method and apparatus
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United States of America Patent
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Jun 9, 1992
Issued Date -
N/A
app pub date -
Jun 18, 1991
filing date -
Mar 9, 1989
priority date (Note) -
In Force
status (Latency Note)
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Abstract
An exposure method, includes the steps of directing a radiation beam to a substrate to be exposed; and substantially correcting any change in the size of the radiation beam. Also, there is disclosed an exposure apparatus, which includes a laser for emitting a laser beam; a detector for detecting any change in the size of the laser beam; and a device for directing the laser beam to a substrate to be exposed, the directing device including a compensator responsive to an output signal from the detector for substantially correcting the change in the beam size.
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