Process for reducing the reflectivity of sputtered films
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United States of America Patent
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-
Jul 7, 1992
Grant Date -
N/A
app pub date -
Nov 30, 1990
filing date -
Nov 30, 1989
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A process for reducing the reflectivity of films which are produced by sputtering and are to be structured in semiconductor technology, especially a photographic technique, includes varying a process parameter at the end of the sputtering process resulting in a partial film mear the surface havaing reduced reflectivity while other properties of the film remain substantially the same.
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