Apparatus for and method of projecting a mask pattern on a substrate
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 1, 1992
Grant Date -
N/A
app pub date -
Jan 24, 1991
filing date -
Mar 5, 1990
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A projection apparatus is described having a reference plate with a set of grating marks in X and Y directions for aligning with an exposure mask having similar marks, and having four detectors for each mark, and having a lens system for projecting only the relevant mark on the relevant detector. A method of projecting is also described in which the detection signals are simultaneously processed with other signals to result in a control signal to adjust image quality.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully