Cyclotron resonance chemical vapor deposition method of forming a halogen-containing diamond on a substrate
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United States of America Patent
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Sep 8, 1992
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N/A
app pub date -
Feb 16, 1990
filing date -
Aug 10, 1987
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Expired
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Abstract
Diamond films or i-carbon films can be formed on a surface by virtue of cyclotron resonance chemical vapor deposition. The characteristics such as transmissivity, conductivity and hardness of the films can be easily controlled by introducing a halogen into the films.
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