Polishing process for refractory materials
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United States of America Patent
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Oct 13, 1992
Grant Date -
N/A
app pub date -
Jun 11, 1991
filing date -
Jun 11, 1991
priority date (Note) -
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Abstract
A cost-effective process for polishing refractory materials, including natural and synthetic diamond, sapphire, ruby and Si.sub.3 N.sub.4 balls, is disclosed, wherein the surfaces thereof are successively softened to a predetermined depth by ion implantation, followed by mechanical polishing. This cycle of ion-implantation softening, followed by mechanical polishing, is repeated until such time that surface profilometry indicates that a desired surface smoothness has been achieved.
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