Method for removing contaminants by maintaining the plasma in abnormal glow state

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5163458
SERIAL NO

07704211

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

An apparatus is disclosed for abrading contaminants from the surface of a workpiece using plasma glow discharge. The workpieces are positioned in a low pressure chamber with an ionizable gas. A pair of spaced, conductive, interfacing panels form electrodes mounted within the chamber and defining a three-dimensional cleaning space between the electrodes. The electrodes are energized by a power supply, providing an alternating voltage at an ultrasonic frequency and the pressure is maintained to allow only abnormal glow discharge. After initiation of the abnormal glow discharge the electrode current is sensed to detect when to inject additional ionizable gas into the low pressure chamber.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
OPTEK INCA CORPORATION OF OHIO 5229 CHESHIRE RD GALENA OH 43021

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Monroe, Marvin E Sunbury, OH 5 74

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation