Optical reticle inspection system and method
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United States of America Patent
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Nov 17, 1992
Grant Date -
N/A
app pub date -
Jul 15, 1991
filing date -
Jul 15, 1991
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An optical reticle inspection system and method employing a photolithographic projection optical system. The present invention provides for imaging a reticle pattern to be inspected onto a complementary reticle pattern and directly viewing the obscured image pattern to provide a measure of the fidelity of the reticle patterns.
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