Illuminator for microlithographic integrated circuit manufacture
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United States of America Patent
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Nov 24, 1992
Grant Date -
N/A
app pub date -
Dec 20, 1991
filing date -
Dec 20, 1991
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The illuminator apparatus disclosed herein provides illumination for the microlithographic manufacture of semiconductor integrated circuits. Degradation of the illuminator output by photopolymerization of volatile compounds associated with the resist coatings is inhibited by utilizing a composite filter at the cooling area inlet to the light source which includes a bed of activated carbon for removing volatile compounds which are photopolymerizable to substances which are absorbtive at the exposing wavelengths.
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