Programmable antifuse structure, process, logic cell and architecture for programmable integrated circuits
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 24, 1992
Grant Date -
N/A
app pub date -
Jan 22, 1991
filing date -
Jan 22, 1991
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An integrated circuit of the present invention comprises antifuse elements which have been fabricated by depositing at under 500.degree. C. an antifuse layer approximately 30 nanometers to 400 nanometers between layers of titanium (Ti), said antifuse layer comprising a stoichiometric or off-stoichiometric amorphous silicon-based dielectric layer, such that a heating of the said antifuse layer in excess of 500.degree. C. by electrical or energy beam means will cause a chemical reduction reaction between the titanium and silicon-dioxide layers that yields more Ti.sub.5 Si.sub.3, TiSi, and/or TiSi.sub.2 than is yielded TiO, Ti.sub.2 O.sub.3, Ti.sub.3 O.sub.5, and/or TiO.sub.2, and such that there results a conductive compound between said titanium layers which constitutes a short circuit.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully