Stereolithography method
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United States of America Patent
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Dec 1, 1992
Issued Date -
N/A
app pub date -
Feb 5, 1991
filing date -
Dec 21, 1990
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An improved stereolithography method for building a three-dimensional article including the steps of patternwise curing successive layers of a bath of curable liquid resin formulation until the article has been completely built up, removing the article from the liquid resin bath and then post-curing the article, wherein the liquid resin is a 'thiol/nene' formulation including: (a) a first compound having a plurality of norbornene groups thereon; (b) a second compound having a plurality of thiol groups therein; and (c) a free radical photoinitiator, the total functionality of the formulation being greater than 4.
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