Polish containing derivatized amine functional organosilicon compounds
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United States of America Patent
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-
Dec 29, 1992
Grant Date -
N/A
app pub date -
Nov 7, 1991
filing date -
Nov 7, 1991
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A polish formulation containing as components thereof at least one member selected from the group consisting of waxes, solvents, surfactants, thickening agents, abrasives, dyes, odorants and other ingredients normally used in making polishes. The improvement resides in incorporating into the polish formulation a derivatized amine functional organosilicon compound.
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Cited Art Landscape
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