Fabrication of polycrystalline free-standing diamond films

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United States of America Patent

PATENT NO 5183529
SERIAL NO

07604692

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Abstract

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Method of fabricating free-standing diamond films by depositing and adhering polycrystalline diamond by hot filament chemical vapor deposition (1-100 Torr, filament temperature equal to or greater than 1900.degree. C., substrate temperature of 650.degree.-950.degree. C.) onto a substrate meltable at a temperature slightly in excess of the deposition temperature; and (b) prior to cooling said polycrystalline diamond particles, increasing (50.degree.-300.degree. C.) the substrate temperature to melt at least a portion thereof while permitting such melt to emigrate from the diamond films.

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Patent Owner(s)

Patent OwnerAddress
NATIONAL INSTITUTE FOR STRATEGIC TECHNOLOGY2005 RESEARCH PARK CIRCLE MANHATTAN KS 66502

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Potter, Timothy J Dearborn, MI 44 564
Tamor, Michael A Toledo, OH 15 790
Wu, Ching-Hsong Farmington Hills, MI 8 152

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