Plasma processing method and products thereof

United States of America Patent

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Feb 9, 1993
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N/A
app pub date
Oct 5, 1989
filing date
Oct 11, 1988

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Expired

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Abstract

Carbonaceous films are coated on a surface by chemical vapor reation. In advance of the deposition of carbonaceous film, a silicon nitride film as coated on the surface to prevent interdiffusion between the carbonaceous film and the underlying surface.

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Patent Owner	Address
SEMICONDUCTOR ENERGY LABORATORY CO LTD	398 HASE ATSUGI-SHI KANAGAWA 2430036 ?2430036

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Inventor Name	Address	# of filed Patents	Total Citations
Hayashi, Shigenori	Atsugi, JP	85	3991
Ishida, Noriya	Atsugi, JP	14	240
Itou, Kenji	Zama, JP	28	272
Kadono, Masaya	Atsugi, JP	21	275
Kojima, Masahiro	Atsugi, JP	133	968
Sasaki, Mari	Atsugi, JP	20	199
Takeyama, Junichi	Atsugi, JP	12	771
Yamazaki, Shunpei	Tokyo, JP	7534	239327

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Plasma processing method and products thereof

Number of patents in Portfolio can not be more than 2000

United States of America Patent

07417311

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PATENT NO	5185179
SERIAL NO	07417311
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07417311

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