Apparatus for cleaning silicon wafer
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United States of America Patent
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-
Feb 16, 1993
Grant Date -
N/A
app pub date -
Dec 10, 1991
filing date -
Dec 14, 1990
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Device for cleaning silicon wafers having an upper mist-generating chamber with a high frequency oscillator to generate an aqueous hydrofluoric acid mist and a lower region processing chamber separated by a partitioning wall having a shutter to open and close. Silicon wafers are held in an upright position in a rack. The processing chamber and the shutter have gas jets to eject gas between the silicon wafers and water spray heads in the processing chamber to spray water between the silicon wafers.
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