Chemically sensitive, dimensionally-stable organosilicon material composition and techniques

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United States of America Patent

PATENT NO 5194391
SERIAL NO

07720983

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Abstract

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A dimensionally-stable organosilicon material composition and method for producing the material composition including non-crosslinkable, continuous phase silicone with silica filler material dispersed therethrough, and having dissolved therein a variably-radiative material (e.g., ruthenium dye) responsive to the concentration of a selected analyte (e.g., oxygen), and the products of a reaction between water and a modifier material selected for establishing the sensitivity of said variably-radiative material to the selected analyte.

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Patent Owner(s)

Patent OwnerAddress
HEWLETT-PACKARD COMPANY3000 HANOVER STREET PALO ALTO CALIFORNIA 94304 UNITED STATES OF AMERICA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Holloway, Robert R Montara, CA 9 370
Nauze, Ganapati R Sunnyvale, CA 1 114
Spira-Solomon, Darlene J Stanford, CA 6 344

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