Dielectric composition and solder interconnection structure for its use

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United States of America Patent

PATENT NO 5194930
SERIAL NO

07760654

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Abstract

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Composition and solder interconnection structure for its use, wherein the gap created by solder connections between a carrier substrate and a semiconductor chip device mounted thereon is filled with the solvent free formulation obtained by curing a preparation containing a cycloaliphatic polyepoxide and/or curable cyanate ester or prepolymer thereof, polyol, and filler which is substantially free of alpha particle emissions.

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Patent Owner(s)

Patent OwnerAddress
INTENRATIONAL BUSINESS MACHINES CORPORATIONNEW ORCHARD ROAD ARMONK NY 10504

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Christie, Frederick R Endicott, NY 7 433
Papathomas, Kostas Endicott, NY 31 983
Poliks, Mark D Vestal, NY 43 1214
Wang, David W Vestal, NY 45 1367

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