Holographic optical notch reflectors
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United States of America Patent
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Mar 30, 1993
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N/A
app pub date -
Dec 27, 1990
filing date -
Dec 27, 1990
priority date (Note) -
Expired
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Abstract
A new method for making holographic notch filters in the near infrared spectral region is disclosed. This method utilizes lthe nonlinearity in the response function of holographic materials. When a holographic medium is exposed to two laser beams at different wavelengths, the nonlinearity in the response function causes the formation of notch reflections at wavelengths corresponding to the sum and difference frequencies of the exposing beams. The notch at the difference frequency can be in the NIR region by properly choosing the exposure wavelengths. This method is applicable to holographic filters on both flat and curved substrates.
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