Substrate heat-treating apparatus
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United States of America Patent
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Apr 13, 1993
Grant Date -
N/A
app pub date -
Sep 30, 1991
filing date -
Oct 2, 1990
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An apparatus for heat-treating substrates includes a plurality of heat-treating units arranged in vertical stages, and at least one hollow column for supporting the heat-treating units. Each heat-treating unit has an exhaust line communicating with the column to exhaust gases from the heat-treating units through the column by suction.
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