Method for making tapered microminiature silicon structures
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United States of America Patent
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Apr 13, 1993
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Oct 8, 1991
filing date -
Jul 12, 1990
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Abstract
Tapered silicon structures, of interest for use, e.g., in atomic force microscopes, in field-emission devices, and in solid state devices are made using silicon processing technology. Resulting tapered structures have, at their tip, a radius of curvature of 10 nanometers or less. Such preferred silicon structures are particularly suited as electron emitters in display devices.
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