Resist process system
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United States of America Patent
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Apr 13, 1993
Issued Date -
N/A
app pub date -
Jun 25, 1992
filing date -
Feb 12, 1988
priority date (Note) -
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status (Latency Note)
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Abstract
A resist process system of the present invention includes at least two robots for conveying a wafer, a passage through which the robots can move, plural process units arranged along the passage, and a waiting unit for temporarily holding the wafer which is to be processed. The waiting unit is arranged beside the passage and between the process units and it includes plural compartments partitioned in it.
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