Process for producing electrically impervious anodized films on valve metals and product thereof
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United States of America Patent
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May 18, 1993
Grant Date -
N/A
app pub date -
Apr 22, 1992
filing date -
Apr 22, 1992
priority date (Note) -
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Abstract
A method is disclosed for producing an anodized film on titanium, its alloys and other metals such that the film deposited will have a specific leak rate of less than one nanoamp per square centimeter at room temperature with an impressed electric field of at least five volts, where the anodization is performed in a solution consisting of liquid ortho-phosphoric acid of reduced water content in an aprotic solvent, and articles of manufacture therefrom.
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