Dry exhaust gas conditioning
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United States of America Patent
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May 25, 1993
Grant Date -
N/A
app pub date -
Dec 3, 1990
filing date -
Jun 4, 1988
priority date (Note) -
Expired
status (Latency Note)
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Abstract
This invention relates to gas treatment apparatus and methods and particularly, but not exclusively, to such apparatus and methods for use with exhaust products from semi-conductor manufacturing process. A reactor column 10 has an inlet 11 at the bottom and an outlet 12. Between the inlet and outlet it is divided into three sequential stages containing: silicon or silicon containing materials; lime or soda lime and copper oxide or copper oxide reagents.
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