X-ray lithography mirror and method of making same
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United States of America Patent
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-
May 25, 1993
Grant Date -
N/A
app pub date -
Oct 8, 1991
filing date -
Oct 8, 1991
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A polished aspheric mirror focusses a fan X-ray beam from a point source onto a work piece as a straight image line. The work piece can be efficiently exposed to the X-ray beam by simply tilting the aspheric mirror about a rotational axis, causing the focused image line to sweep across the workpiece. The aspheric mirror is designed to collimate the beam in one direction, e.g., the horizontal direction, and focus the beam in the other direction, e.g., the vertical direction, thereby creating the focused image line at the workpiece. This process is achieved by representing the mirror surface as at least a fourth order Maclaurin series polynomial, and by adjusting the coefficients of such Maclaurin series to create and maintain the desired straight image line. The mirror surface is then polished using computer controlled polishing techniques to realize the designed shape.
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Cited Art Landscape
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