US Patent No: 5,216,543

Number of patents in Portfolio can not be more than 2000

Apparatus and method for patterning a film

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ATTORNEY / AGENT: (SPONSORED)
 

Importance

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Abstract

The present invention relates to an apparatus and method for patterning areas of a radiation absorbent film material. In the preferred embodiment, the film material is at least partially electrically conductive. The radiation is focused onto the film by a lenticular lens having a plurality of optically active elements to provide a radiation pattern on the film and remove or displace portions of the film to form a corresponding pattern, preferably a conductive pattern. The film may have one or more layers or regions, but at least one region must be radiation absorbent in order to allow the formation of patterns in the film in accordance with the present invention. The areas of the film affected by the phenomenon of radiation absorption are non-conductive voids which may separate the film into a plurality of conductive grid lines whereby the film is useful with a conductive lens film to increase the apparent efficiency of a photovoltaic cell.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
MINNESOTA MINING AND MANUFACTURING COMPANYST PAUL, MN6633

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Calhoun, Clyde D Stillwater, MN 57 1975

Cited Art

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Patent Citation Ranking

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