Vertical type processing apparatus
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United States of America Patent
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Jun 8, 1993
Grant Date -
N/A
app pub date -
Feb 13, 1992
filing date -
Feb 19, 1991
priority date (Note) -
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Abstract
An ashing apparatus of the vertical type comprises a reaction tube erected in the vertical direction to house therein a plurality of semiconductor wafers, an inner tube arranged in the reaction tube to enclose the semiconductor wafers and having a plurality of holes through which activated radicals in plasma can be selectively passed, a reaction gas supply pipe for supplying reaction gases into a space between the reaction tube and the inner tube, and plasma generating electrode unit located outside the reactor tube to generate plasma of the reaction gases only in the space between the reaction tube and the inner tube.
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