Metal deposition
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United States of America Patent
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Aug 3, 1993
Grant Date -
N/A
app pub date -
Jul 28, 1992
filing date -
Jul 30, 1991
priority date (Note) -
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Abstract
In the deposition of metal on solid substrates by a Metal Organic Chemical Deposition process, an improvement comprises the provision of vapors of a precursor of the metal by passing an inert carrier gas through a mixture of the metal precursor and a liquid having a vapor pressure at ambient temperature lower than that of the metal precursor and in which the metal precursor is at least partially soluble.
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