Dense fluid photochemical process for liquid substrate treatment
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United States of America Patent
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Aug 17, 1993
Issued Date -
N/A
app pub date -
Jan 28, 1991
filing date -
Apr 3, 1989
priority date (Note) -
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Abstract
A process for removing undesired material from a chosen substrate by exposing the substrate simultaneously to ultraviolet radiation and a selected dense fluid, wherein the radiation produces a photochemical reaction that removes the undesired material from the substrate and the dense fluid enhances the removal of the undesired material. In an alternative embodiment, a reactive agent may additionally be used. The process may be used to remove contaminants from a substrate, etch a substrate surface, or destroy toxic organic material in industrial wastes.
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