Wafer probe station having auxiliary chucks
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United States of America Patent
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Aug 17, 1993
Grant Date -
N/A
app pub date -
May 29, 1992
filing date -
May 29, 1992
priority date (Note) -
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status (Latency Note)
Importance
Abstract
A wafer probe station has a wafer-supporting vacuum chuck, together with one or more substrate-supporting auxiliary vacuum chucks having independent vacuum controls for mounting contact substrates and calibration substrates simultaneously with the wafer. A detachable interconnection of the various chucks enables independent replacement of each chuck to accommodate various different chuck types, and also permits the elevations of the respective chuck surfaces to be adjusted relative to each other to compensate for differences in thicknesses between the wafer substrate and the calibration or contact substrates. The invention is especially useful in wafer probe stations equipped with enclosures for controlled-environment testing where a large variety of different wafer chucks must be readily interchangeable for testing under different conditions.
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