Importance

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Abstract

A pressure sealed chamber such as a load lock for a apparatus for processing substrates is provided with a guide plate spaced from a substrate supported therein so as to form a gap which covers the substrate surface to be protected from particulate contamination. During the filling of the chamber and during the evacuation of the chamber, by either pumping or venting, clean gas is introduced through an orifice in the center of the plate so as to flow outwardly from the edge of the gap at a pressure sufficient to deflect or otherwise reduce the number of turbulent gas borne particulates in the chamber from entering the gap and contaminating the surface to be protected of the substrate. During the filling of the chamber, all or some of the gas filling the chamber is introduced through the gap. During the evacuation of the chamber, gas is introduced through the gap at a flow rate less that of the evacuating gas.

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First Claim