Carbonaceous protective films and method of depositing the same

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Aug 24, 1993
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Jul 17, 1989
filing date
Feb 24, 1987

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Expired

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Abstract

Diamond films are formed by chemical vapor reation. Nitrogen or halogen compound gas is inputted to the reaction chamber together with a reactive gas of hydrocarbon. The resistivity, transparency and hardness of the deposited films can be controlled by adjusting the introduction rate of the halogen or nitrogen.

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Patent Owner(s)

Patent Owner	Address
SEMICONDUCTOR ENERGY LABORATORY CO LTD 398 HASE ATSUGI-SHI KANAGAWA-KEN 243 JAPAN A CORP OF JAPAN	Not Provided

International Classification(s)

C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Hamatani, Toshiji	Atsugi, JP	132	5391
Hayashi, Shigenori	Atsugi, JP	85	3991
Yamazaki, Shunpei	Tokyo, JP	7534	239327

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Carbonaceous protective films and method of depositing the same

Number of patents in Portfolio can not be more than 2000

United States of America Patent

07380328

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PATENT NO	5238705
SERIAL NO	07380328
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07380328

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